ArF Photoresist
Xuzhou Bokang is a Chinese supplier of photoresist from raw materials to finished products.
Including ArF-immersion (topcoat less) products and ArF-dry products, the resin structure is a methacrylate/acrylate series system, accompanied by functional units such as adamantane, with the characteristics of high resolution, high sensitivity, etc., and technical capability has reached 28nm technology node. At present, 10+ products have been verified by Chinese well-known 12-inch Fab, and some products have received batch orders.
| Exposure wavelength | Product Name | Technical nodes and applications | Process capability CD | Process capability THK | Image |
|---|---|---|---|---|---|
| 193nm IMM | HTA116 | N40nm-14nm PTD L/S | 0.063um | 0.16-0.24um |  |
| 193nm IMM | HTA112 | N40nm-14nm PTD C/H | 0.080um | 0.13-0.20um |  |
| 193nm Dry | HTA121 | N90-40nm PTD L/S | 0.08um | 0.20-0.30um |  |
| 193nm Dry | HTA1101 | N90-40nm PTD C/H | 0.09um | 0.15-0.21um |  |
| 193nm Dry | HTA1123 | N90-40nm PTD C/H | 0.10um | 0.20-0.30um |  |
| 193nm Dry | HTA1201 | N90-40nm PTD C/H | 0.10um | 0.23-0.35um |  |
| 193nm IMM | HTA2031 | N40nm-14nm PTD C/H | 0.045um | 0.08~0.10um |  |
| 193nm IMM | HTA2011 | N40nm-14nm PTD C/H | 0.065um | 0.09~0.12um |  |
8 Records
